1Chkhalo N.I., 2Golubev S.V., 1Krasilnik Z.F.,
1Polkovnikov V.N., 2Starodubtsev M.V.
(1Institute for Physics of Microstructures RAS, Nizhny Novgorod, Russia ,
2A.V. Gaponov-Grekhov Institute of Applied Physics RAS, Nizhny Novgorod, Russia) Problems and prospects of development of X-ray lithography.